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【晶硅铸锭技术资料库】 今日: 0|主题: 180|排名: 23 

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预览 [分享] ECM+PV600 attachment hui123 2011-1-4 01165 hui123 2011-1-4 09:58
预览 [文献] Engineering the diffusion behavior of dopants (B, Sb) in attachment zhangcunbiao 2010-12-29 01081 zhangcunbiao 2010-12-29 21:40
预览 [文献] Engineering analysis of microdefect formation during attachment zhangcunbiao 2010-12-29 0944 zhangcunbiao 2010-12-29 21:39
预览 [文献] Energetics of oxygen species in crystalline and amorphous attachment zhangcunbiao 2010-12-29 0942 zhangcunbiao 2010-12-29 21:37
预览 [文献] Electronic levels of isolated and oxygen-perturbed hydrogen in attachment recommend zhangcunbiao 2010-12-29 01008 zhangcunbiao 2010-12-29 21:36
预览 [分享] 多晶铸锭技术 attach_img 光谷子 2010-12-26 01171 ceetech 2010-12-26 17:33
预览 [分享] 铸锭工艺讲解 attachment recommend agree 6911620sxw 2010-12-25 01449 6911620sxw 2010-12-25 10:19
预览 [文献] Effects of surface steps on oxygen and boron deposited on Si(1 0 0) attachment zhangcunbiao 2010-12-17 01077 zhangcunbiao 2010-12-17 17:37
预览 [文献] E ffect of oxygen precipitation on voids in bulk silicon attachment zhangcunbiao 2010-12-17 0880 zhangcunbiao 2010-12-17 17:36
预览 [文献] E ffect of nitrogen doping on the minority carrier lifetime in attachment zhangcunbiao 2010-12-17 0878 zhangcunbiao 2010-12-17 17:35
预览 [文献] Effect of heat treatment on carbon in attachment zhangcunbiao 2010-12-17 0953 zhangcunbiao 2010-12-17 17:32
预览 [文献] Effect of fluorine on boron diffusion under interstitial attachment zhangcunbiao 2010-12-17 01194 zhangcunbiao 2010-12-17 17:31
预览 [文献] Effect of enhanced pressure during annealing on the creation of attachment zhangcunbiao 2010-12-17 01331 zhangcunbiao 2010-12-17 17:30
预览 [文献] Early stages of oxygen clustering in hydrogenated Cz-Si: attachment zhangcunbiao 2010-12-17 01111 zhangcunbiao 2010-12-17 17:28
预览 [文献] Do we know the energy levels ofradiation defects in silicon? attachment zhangcunbiao 2010-12-17 0915 zhangcunbiao 2010-12-17 17:26
预览 [文献] DLTS study of oxygen precipitates in silicon annealed attachment agree zhangcunbiao 2010-12-17 0787 zhangcunbiao 2010-12-17 17:25
预览 [分享] MCS450安全操作规范 attach_img agree 6911620sxw 2010-12-17 01059 6911620sxw 2010-12-17 08:54
预览 [文献] Determination of Silicon self-interstitial diffusivity using attachment zhangcunbiao 2010-12-16 01023 zhangcunbiao 2010-12-16 20:26
预览 [文献] Degradation of carrier lifetime in Cz silicon attachment zhangcunbiao 2010-12-16 0947 zhangcunbiao 2010-12-16 20:25
预览 [文献] Defect generation in crystalline silicon irradiated with high attachment zhangcunbiao 2010-12-16 01118 zhangcunbiao 2010-12-16 20:24
预览 [文献] Silicon detectors: Damage, modelling and expected long-time behaviour attachment zhangcunbiao 2010-12-16 0790 zhangcunbiao 2010-12-16 20:23
预览 [文献] Czochralski silicon characterization by using thermoelectric attachment zhangcunbiao 2010-12-15 0837 zhangcunbiao 2010-12-15 18:51
预览 [文献] Crystal-related defects evolution during thin epitaxial layer growth attachment zhangcunbiao 2010-12-15 01000 zhangcunbiao 2010-12-15 18:50
预览 [文献] Complexes of the self-interstitial with oxygen in irradiated attachment zhangcunbiao 2010-12-15 0872 zhangcunbiao 2010-12-15 18:49
预览 [文献] Pressure-induced formation of electrically active centres attachment zhangcunbiao 2010-12-15 01099 zhangcunbiao 2010-12-15 18:47
预览 [文献] Combination of optical measurement and precipitation theory to attachment zhangcunbiao 2010-12-13 0864 zhangcunbiao 2010-12-13 19:17
预览 [文献] Chemical and structural characterization of oxygen attachment zhangcunbiao 2010-12-13 0771 zhangcunbiao 2010-12-13 19:14
预览 [文献] Characterization of the oxygen distribution in Czochralski silicon attachment zhangcunbiao 2010-12-13 0832 zhangcunbiao 2010-12-13 19:12
预览 [文献] Characterization of defects in annealed Czochralski-grown attachment zhangcunbiao 2010-12-13 0879 zhangcunbiao 2010-12-13 19:08
预览 [文献] Characterization of crystallographic defects in thermally oxidized attachment zhangcunbiao 2010-12-13 01027 zhangcunbiao 2010-12-13 19:07
预览 [文献] Characterisation of oxygen and oxygen-related defects in highly- and attachment zhangcunbiao 2010-12-13 0865 zhangcunbiao 2010-12-13 19:06
预览 [分享] Boron–oxygen complexes in Si attachment zhangcunbiao 2010-12-13 0977 zhangcunbiao 2010-12-13 19:03
预览 [文献] Behaviour of oxygen in CZ-silicon during 430–630°C heat attachment zhangcunbiao 2010-12-13 0784 zhangcunbiao 2010-12-13 19:02
预览 [文献] Anomalous oxygen precipitation near the vacancy and attachment zhangcunbiao 2010-12-13 0944 zhangcunbiao 2010-12-13 19:00
预览 [文献] Annealing studies of point defects in low dose MeV ion attachment zhangcunbiao 2010-12-13 0810 zhangcunbiao 2010-12-13 18:55
预览 [文献] Annealing Annealing effect and impurity doping effects on the defect generation attachment zhangcunbiao 2010-12-13 0808 zhangcunbiao 2010-12-13 18:54
预览 [文献] Annealing behaviors of vacancy in varied neutron irradiated attachment zhangcunbiao 2010-12-13 0773 zhangcunbiao 2010-12-13 18:52
预览 [文献] Analysis of the oxygen impurity atoms beneath the surface attachment zhangcunbiao 2010-12-13 0784 zhangcunbiao 2010-12-13 18:50
预览 [文献] Analysis of extended defects in nitrogen annealed CZ silicon by attachment zhangcunbiao 2010-12-13 0750 zhangcunbiao 2010-12-13 18:49
预览 [文献] accurate infrared absorption measure attachment zhangcunbiao 2010-12-13 0670 zhangcunbiao 2010-12-13 18:47
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